Dec 16, 2020
Sixteen-bit Computer Aided Font Development software and tools for designing and developing Tamil font.
Tamil Typing software by Anand, India. Tamil letters from India with an English translation.
Tamil Keyboard with Latin letters: Typing is extremely easy and quick with just a keyboard using this font.
Apr 26, 2020
Tamil Font Type For Mac Os with inbuilt SMS, Camera, Clock, Chatin and Clock. This Tamil Font Type is released to give the people an easy way to use this Tamil Font Type.
Feb 22, 2019
Tamil Font Type for Windows: With inbuilt SMS, Camera, Clock, Chatin and Clock. This Tamil Font Type is released to give the people an easy way to use this Tamil Font Type
Jan 14, 2019
Tamil Typing Software for any Computer or Mobile Device : This Tamil Typing Software is the best solution for typing in Tamil language to type any kind of message with this Tamil Typing Software..
Jul 3, 2017
Tamil Font is installed into Microsoft Windows 10 OS. In this program you can speak the Tamil language in Microsoft Windows 10. The font, used by the program, has been developed for Windows 7 and 8.
May 30, 2016
Type in 700 'Language + Font + Keyboard' combinations. ALL the XML files of Azhagi+ are very easily editable in NOTEPAD application.
1. Field of the Invention
The present invention relates to a method for manufacturing a semiconductor device, and more particularly, to a method for manufacturing a semiconductor device which can improve a contact resistance.
2. Description of the Prior Art
As semiconductor devices become more highly integrated, the area of contact between the source/drain and the substrate becomes smaller. Consequently, the distance between the two areas becomes closer. A shallow junction is thus used as a contact structure. Thus, a contact resistance between the source/drain and the substrate can be reduced. However, a leak current increases with the reduction of the distance between the source/drain and the substrate.
In order to improve this, a salicide technology has been used. According to this technology, a titanium silicide (TiSi2) is formed on the source/drain to decrease the resistance of the source/drain. At this time, the TiSi2 is formed by reaction between a titanium layer and a silicide layer formed on the source/drain. ac619d1d87
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